Interlayer-Engineered Local Epitaxial Templating Induced Enhancement in Polarization (2Pr > 70 μC/cm2) in Hf0.5Zr0.5O2 Thin Films

Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films

(2022) Shelby S. Fields et al.   Advanced Electronic Materials

Imprint issue during retention tests for HfO2-based FRAM: An industrial challenge?

(2021) J. Bouaziz et al.   APPLIED PHYSICS LETTERS

The Influence of Top and Bottom Metal Electrodes on Ferroelectricity of Hafnia

(2021) Yongsun Lee et al.   IEEE TRANSACTIONS ON ELECTRON DEVICES

Local epitaxial-like templating effects and grain size distribution in atomic layer deposited Hf0.5Zr0.5O2 thin film ferroelectric capacitors

(2021) S. F. Lombardo et al.   APPLIED PHYSICS LETTERS

Impacts of surface nitridation on crystalline ferroelectric phase of Hf1-xZrxO2 and ferroelectric FET performance

(2021) Yi-Jan Lin et al.   APPLIED PHYSICS LETTERS

Many routes to ferroelectric HfO2: A review of current deposition methods

(2021) Hanan Alexandra Hsain et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Insertion of HfO2 Seed/Dielectric Layer to the Ferroelectric HZO Films for Heightened Remanent Polarization in MFM Capacitors

(2020) Vekateswarlu Gaddam et al.   IEEE TRANSACTIONS ON ELECTRON DEVICES

Compositional dependence of crystallization temperatures and phase evolution in hafnia-zirconia (HfxZr1−x)O2 thin films

(2020) H. Alex Hsain et al.   APPLIED PHYSICS LETTERS

The future of ferroelectric field-effect transistor technology

(2020) Asif Islam Khan et al.   Nature Electronics

Recent progress for obtaining the ferroelectric phase in hafnium oxide based films: impact of oxygen and zirconium

(2019) Uwe Schroeder et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Demonstration of High Ferroelectricity (P$_r$ ~ 29 $\mu$ C/cm2) in Zr Rich HfxZr1–xO2 Films

(2019) Dipjyoti Das et al.   IEEE ELECTRON DEVICE LETTERS

Effects of Capping Electrode on Ferroelectric Properties of Hf0.5Zr0.5O2 Thin Films

(2018) Rongrong Cao et al.   IEEE ELECTRON DEVICE LETTERS

Ferroelectric Hf0.5Zr0.5O2 Thin Films: A Review of Recent Advances

(2018) Si Joon Kim et al.   JOM

Review and perspective on ferroelectric HfO2-based thin films for memory applications

(2018) Min Hyuk Park et al.   MRS Communications

Nucleation-Limited Ferroelectric Orthorhombic Phase Formation in Hf0.5 Zr0.5 O2 Thin Films

(2018) Young Hwan Lee et al.   Advanced Electronic Materials

More features, more tools, more CrysTBox

(2017) Miloslav Klinger   JOURNAL OF APPLIED CRYSTALLOGRAPHY

The origin of ferroelectricity in Hf1−xZrxO2: A computational investigation and a surface energy model

(2015) R. Materlik et al.   JOURNAL OF APPLIED PHYSICS

Impact of different dopants on the switching properties of ferroelectric hafniumoxide

(2014) Uwe Schroeder et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Impact of layer thickness on the ferroelectric behaviour of silicon doped hafnium oxide thin films

(2012) Ekaterina Yurchuk et al.   THIN SOLID FILMS

Ferroelectricity in hafnium oxide thin films

(2011) T. S. Böscke et al.   APPLIED PHYSICS LETTERS