Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2

Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2

(2021) Karsten Arts et al.   Journal of Physical Chemistry C

Surface Energy Change of Atomic-Scale Metal Oxide Thin Films by Phase Transformation

(2020) Il-Kwon Oh et al.   ACS Nano

Plasma deposition—Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition

(2020) Christophe Vallée et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate

(2020) K. Arts et al.   APPLIED PHYSICS LETTERS

Structural, optical, and mechanical properties of TiO2 nanolaminates

(2020) Lilit Ghazaryan et al.   NANOTECHNOLOGY

Impact of Growth Conditions on Phase Selectivity and Epitaxial Quality of TiO2 films Grown by Plasma Assisted Atomic Layer Deposition

(2019) Jason R. Avila et al.   CHEMISTRY OF MATERIALS

Status and prospects of plasma-assisted atomic layer deposition

(2019) Harm C. M. Knoops et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2

(2019) Karsten Arts et al.   Journal of Physical Chemistry C

Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies

(2018) Tahsin Faraz et al.   ACS Applied Materials & Interfaces

Atomic Layer Deposition for Spacer Defined Double Patterning of sub-10 nm Titanium Dioxide Features

(2018) Stefano Dallorto et al.   NANOTECHNOLOGY

TiO2 inverse opal photonic crystals: Synthesis, modification, and applications - A review

(2018) Jie Yu et al.   JOURNAL OF ALLOYS AND COMPOUNDS

Energetic Ions during Plasma-Enhanced Atomic Layer Deposition and their Role in Tailoring Material Properties

(2018) Tahsin Faraz et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma

(2017) Akhil Sharma et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors

(2016) J Provine et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Relationships among growth mechanism, structure and morphology of PEALD TiO2films: the influence of O2plasma power, precursor chemistry and plasma exposure mode

(2016) W Chiappim et al.   NANOTECHNOLOGY

Microscopic silicon-based lateral high-aspect-ratio structures for thin film conformality analysis

(2015) Feng Gao et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition

(2015) Peter Schindler et al.   LANGMUIR

Effects of TiO2 Interfacial Atomic Layers on Device Performances and Exciton Dynamics in ZnO Nanorod Polymer Solar Cells

(2014) Mi-Jin Jin et al.   ACS Applied Materials & Interfaces

UV Irradiation Induced Transformation of TiO2 Nanoparticles in Water: Aggregation and Photoreactivity

(2014) Jing Sun et al.   ENVIRONMENTAL SCIENCE & TECHNOLOGY

Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide

(2014) Stephan Ratzsch et al.   NANOTECHNOLOGY

Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth

(2012) H. B. Profijt et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films

(2011) H. B. Profijt et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Controlling the Crystallinity and Roughness of Atomic Layer Deposited Titanium Dioxide Films

(2011) Riikka L. Puurunen et al.   JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY

Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

(2011) H. B. Profijt et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Titanium Oxide Thin Films Prepared by Plasma Enhanced Atomic Layer Deposition Using Remote Electron Cyclotron Resonance Plasma for Organic Devices Passivation

(2010) Byung-Woo Kang et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Conformality of Plasma-Assisted ALD: Physical Processes and Modeling

(2010) H. C. M. Knoops et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition

(2010) Chang-Soo Lee et al.   THIN SOLID FILMS

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS

In situspectroscopic ellipsometry as a versatile tool for studying atomic layer deposition

(2009) E Langereis et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Al-Doped TiO2 Films with Ultralow Leakage Currents for Next Generation DRAM Capacitors

(2008) Seong Keun Kim et al.   ADVANCED MATERIALS

Titanium Dioxide Thin Films Deposited by Plasma Enhanced Atomic Layer Deposition for OLED Passivation

(2008) Woong-Sun Kim et al.   JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY

Growth Kinetics and Crystallization Behavior of TiO[sub 2] Films Prepared by Plasma Enhanced Atomic Layer Deposition

(2008) Qi Xie et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

TiO2 photocatalysis and related surface phenomena

(2008) A FUJISHIMA et al.   SURFACE SCIENCE REPORTS