Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate

Plasma deposition—Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition

(2020) Christophe Vallée et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure

(2020) Saurabh Karwal et al.   PLASMA CHEMISTRY AND PLASMA PROCESSING

Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3 extracted from their impact on film conformality

(2019) Karsten Arts et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Status and prospects of plasma-assisted atomic layer deposition

(2019) Harm C. M. Knoops et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

ToF-SIMS 3D Analysis of Thin Films Deposited in High Aspect Ratio Structures via Atomic Layer Deposition and Chemical Vapor Deposition

(2019) Alireza M. Kia et al.   Nanomaterials

Surface-Inhibiting Effect in Chemical Vapor Deposition of Boron–Carbon Thin Films from Trimethylboron

(2019) Laurent Souqui et al.   CHEMISTRY OF MATERIALS

Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2

(2019) Karsten Arts et al.   Journal of Physical Chemistry C

Atomic layer deposition of silicon-based dielectrics for semiconductor manufacturing: Current status and future outlook

(2019) Rafaiel A. Ovanesyan et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies

(2018) Tahsin Faraz et al.   ACS Applied Materials & Interfaces

Modeling growth kinetics of thin films made by atomic layer deposition in lateral high-aspect-ratio structures

(2018) Markku Ylilammi et al.   JOURNAL OF APPLIED PHYSICS

Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing

(2018) S. Karwal et al.   Journal of Materials Chemistry C

Energetic Ions during Plasma-Enhanced Atomic Layer Deposition and their Role in Tailoring Material Properties

(2018) Tahsin Faraz et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Nucleation and Conformality of Iridium and Iridium Oxide Thin Films Grown by Atomic Layer Deposition

(2016) Miika Mattinen et al.   LANGMUIR

Measurement of deposition rate and ion energy distribution in a pulsed dc magnetron sputtering system using a retarding field analyzer with embedded quartz crystal microbalance

(2016) Shailesh Sharma et al.   REVIEW OF SCIENTIFIC INSTRUMENTS

Microscopic silicon-based lateral high-aspect-ratio structures for thin film conformality analysis

(2015) Feng Gao et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

(2014) Matti Putkonen et al.   THIN SOLID FILMS

Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties

(2012) G. Dingemans et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth

(2012) H. B. Profijt et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Ion energy distribution measurements in rf and pulsed dc plasma discharges

(2012) D Gahan et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

(2011) H. B. Profijt et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS

Retarding Field Analyzer for Ion Energy Distribution Measurement Through a Radio-Frequency or Pulsed Biased Sheath

(2009) David Gahan et al.   Plasma Processes and Polymers