Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma

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Title
Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
Authors
Keywords
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Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 35, Issue 1, Pages 01B130
Publisher
American Vacuum Society
Online
2016-12-21
DOI
10.1116/1.4972210

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