Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2

Plasma deposition—Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition

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Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate

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Oxygen (3P) atom recombination on a Pyrex surface in an O2 plasma

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Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2

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Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies

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Modeling growth kinetics of thin films made by atomic layer deposition in lateral high-aspect-ratio structures

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Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors

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Self-Limited Reaction-Diffusion in Nanostructured Substrates: Surface Coverage Dynamics and Analytic Approximations to ALD Saturation Times

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Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties

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Surface Loss in Ozone-Based Atomic Layer Deposition Processes

(2011) Harm C.M. Knoops et al.   CHEMISTRY OF MATERIALS

Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

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Surface recombination of oxygen atoms in O2plasma at increased pressure: I. The recombination probability and phenomenological model of surface processes

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Conformality of Plasma-Assisted ALD: Physical Processes and Modeling

(2010) H. C. M. Knoops et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS