Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2

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Title
Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
Authors
Keywords
-
Journal
Journal of Physical Chemistry C
Volume 123, Issue 44, Pages 27030-27035
Publisher
American Chemical Society (ACS)
Online
2019-10-17
DOI
10.1021/acs.jpcc.9b08176

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