Nanoindentation and nanoscratching analysis of high transparent F:SiOx thin films deposited by plasma polymerization
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Title
Nanoindentation and nanoscratching analysis of high transparent F:SiOx thin films deposited by plasma polymerization
Authors
Keywords
Fluorine doped silicon oxide, Optical absorbance, Nanoindentation, Elastic modulus, H/E ratio
Journal
JOURNAL OF NON-CRYSTALLINE SOLIDS
Volume 551, Issue -, Pages 120410
Publisher
Elsevier BV
Online
2020-09-30
DOI
10.1016/j.jnoncrysol.2020.120410
References
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