Characterization of PECVD ultralow dielectric constant porous SiOCH films using triethoxymethylsilane precursor and cinene porogen

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Title
Characterization of PECVD ultralow dielectric constant porous SiOCH films using triethoxymethylsilane precursor and cinene porogen
Authors
Keywords
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Journal
JOURNAL OF PHYSICS D-APPLIED PHYSICS
Volume 51, Issue 11, Pages 115103
Publisher
IOP Publishing
Online
2018-02-12
DOI
10.1088/1361-6463/aaae79

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