Properties of fluorinated silica glass deposited at low temperature by atmospheric plasma-enhanced chemical vapor deposition

Published 2010 View Full Article

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Title
Properties of fluorinated silica glass deposited at low temperature by atmospheric plasma-enhanced chemical vapor deposition
Authors
Keywords
-
Journal
THIN SOLID FILMS
Volume 519, Issue 4, Pages 1307-1313
Publisher
Elsevier BV
Online
2010-09-27
DOI
10.1016/j.tsf.2010.09.030

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