Characteristics of ultra low-k nanoporous and fluorinated silica based films prepared by plasma enhanced chemical vapor deposition
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Title
Characteristics of ultra low-k nanoporous and fluorinated silica based films prepared by plasma enhanced chemical vapor deposition
Authors
Keywords
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Journal
JOURNAL OF APPLIED PHYSICS
Volume 114, Issue 21, Pages 214102
Publisher
AIP Publishing
Online
2013-12-07
DOI
10.1063/1.4845755
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