Nanoindentation and nanoscratching analysis of high transparent F:SiOx thin films deposited by plasma polymerization

标题
Nanoindentation and nanoscratching analysis of high transparent F:SiOx thin films deposited by plasma polymerization
作者
关键词
Fluorine doped silicon oxide, Optical absorbance, Nanoindentation, Elastic modulus, H/E ratio
出版物
JOURNAL OF NON-CRYSTALLINE SOLIDS
Volume 551, Issue -, Pages 120410
出版商
Elsevier BV
发表日期
2020-09-30
DOI
10.1016/j.jnoncrysol.2020.120410

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