The role of oxygen plasma in the formation of oxygen defects in HfOx films deposited at room temperature
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Title
The role of oxygen plasma in the formation of oxygen defects in HfOx films deposited at room temperature
Authors
Keywords
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Journal
Journal of Materials Chemistry C
Volume 3, Issue 16, Pages 4104-4114
Publisher
Royal Society of Chemistry (RSC)
Online
2015-03-09
DOI
10.1039/c4tc02838d
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