Improved reliability from a plasma-assisted metal-insulator-metal capacitor comprising a high-k HfO2 film on a flexible polyimide substrate

Published 2010 View Full Article

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Title
Improved reliability from a plasma-assisted metal-insulator-metal capacitor comprising a high-k HfO2 film on a flexible polyimide substrate
Authors
Keywords
-
Journal
PHYSICAL CHEMISTRY CHEMICAL PHYSICS
Volume 12, Issue 11, Pages 2582
Publisher
Royal Society of Chemistry (RSC)
Online
2010-01-26
DOI
10.1039/b917604g

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