The effects of vacuum ultraviolet radiation on low-kdielectric films

Time-dependent dielectric breakdown of plasma-exposed porous organosilicate glass

(2012) M. T. Nichols et al.   APPLIED PHYSICS LETTERS

Equivalent-circuit model for vacuum ultraviolet irradiation of dielectric films

(2012) Harsh Sinha et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Charging response of back-end-of-the-line barrier dielectrics to VUV radiation

(2012) H. Sinha et al.   THIN SOLID FILMS

Effect of vacuum ultraviolet and ultraviolet irradiation on mobile charges in the bandgap of low-k-porous organosilicate dielectrics

(2011) H. Sinha et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Effects of vacuum ultraviolet radiation on deposited and ultraviolet-cured low-k porous organosilicate glass

(2011) H. Sinha et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Plasma and vacuum ultraviolet induced charging of SiO2 and HfO2 patterned structures

(2011) J. L. Lauer et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Effect of the dielectric–substrate interface on charge accumulation from vacuum ultraviolet irradiation of low-k porous organosilicate dielectrics

(2011) H. Sinha et al.   THIN SOLID FILMS

Surface potential due to charge accumulation during vacuum ultraviolet exposure for high-k and low-k dielectrics

(2010) H. Ren et al.   APPLIED PHYSICS LETTERS

Effect of vacuum ultraviolet and ultraviolet Irradiation on capacitance-voltage characteristics of low-k-porous organosilicate dielectrics

(2010) H. Sinha et al.   APPLIED PHYSICS LETTERS

Numerical simulation of vacuum-ultraviolet irradiation of dielectric layers

(2010) H. Sinha et al.   APPLIED PHYSICS LETTERS

Direct measurement of giant electrocaloric effect in BaTiO3 multilayer thick film structure beyond theoretical prediction

(2010) Yang Bai et al.   APPLIED PHYSICS LETTERS

Ultraviolet radiation effects on paramagnetic defects in low-κ dielectrics for ultralarge scale integrated circuit interconnects

(2010) B. C. Bittel et al.   APPLIED PHYSICS LETTERS

Effect of F doping on capacitance–voltage characteristics of SiCOH low-kfilms metal–insulator–semiconductor structure

(2010) Ye Chao et al.   Chinese Physics B

Synergistic damage effects of vacuum ultraviolet photons and O2in SiCOH ultra-low-kdielectric films

(2010) J Lee et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Charge Trapping within UV and Vacuum UV Irradiated Low-k Porous Organosilicate Dielectrics

(2010) J. L. Lauer et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Reflectance and substrate currents of dielectric layers under vacuum ultraviolet irradiation

(2010) H. Sinha et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Porous pSiCOH Ultralow-kDielectrics for Chip Interconnects Prepared by PECVD

(2009) Alfred Grill   Annual Review of Materials Research

Effect of thermal annealing on charge exchange between oxygen interstitial defects within HfO2 and oxygen-deficient silicon centers within the SiO2/Si interface

(2009) J. L. Lauer et al.   APPLIED PHYSICS LETTERS

Low Dielectric Constant Materials

(2009) Willi Volksen et al.   CHEMICAL REVIEWS

Charge trapping at the low-k dielectric-silicon interface probed by the conductance and capacitance techniques

(2008) J. M. Atkin et al.   APPLIED PHYSICS LETTERS

On the nature of native defects in high OH-content silica glasses: A first-principles study

(2008) M. Benoit et al.   EPL

Analysis of electrically biased paramagnetic defect centers in HfO2 and HfxSi1−xO2/(100)Si interfaces

(2008) P. T. Chen et al.   JOURNAL OF APPLIED PHYSICS

Interface engineering for high interfacial strength between SiCOH and porous SiCOH interconnect dielectrics and diffusion caps

(2008) A. Grill et al.   JOURNAL OF APPLIED PHYSICS

Photocurrent spectroscopy of low-k dielectric materials: Barrier heights and trap densities

(2008) J. M. Atkin et al.   JOURNAL OF APPLIED PHYSICS

Plasma damage mechanisms for low-k porous SiOCH films due to radiation, radicals, and ions in the plasma etching process

(2008) Saburo Uchida et al.   JOURNAL OF APPLIED PHYSICS

Ultraviolet-Assisted Curing of Organosilicate Glass Low-k Dielectric by Excimer Lamps

(2008) Salvador Eslava et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Conduction Mechanisms of Ta/Porous SiCOH Films under Electrical Bias

(2008) Ya Ou et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Modifications of dielectric films induced by plasma ashing processes: Hybrid versus porous SiOCH materials

(2008) M. Darnon et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B