Journal
ADVANCED MATERIALS INTERFACES
Volume 1, Issue 3, Pages -Publisher
WILEY-BLACKWELL
DOI: 10.1002/admi.201300102
Keywords
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Funding
- EU FP7 NMP project
- LAMAND project [245565]
- Science Foundation Ireland [09/IN.1/602]
- SFI through the CRANN CSET
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In block copolymer (BCP) nanolithography, microphase separated polystyrene-block -polydimethylsiloxane (PS-b-PDMS) thin films are particularly attractive as they can form small features and the two blocks can be readily differentiated during pattern transfer. However, PS-b-PDMS is challenging because the chemical differences in the blocks can result in poor surface-wetting, poor pattern orientation control and structural instabilities. Usually the interfacial energies at substrate surface are engineered with the use of a hydroxyl-terminated polydimethylsiloxane (PDMS-OH) homopolymer brush. Herein, we report a facile, rapid and tuneable molecular functionalization approach using hexamethyldisilazane (HMDS). The work is applied to both planar and topographically patterned substrates and investigation of graphoepitaxial methods for directed self-assembly and long-range translational alignment of BCP domains is reported. The hexagonally arranged in-plane and out-of-plane PDMS cylinders structures formed by microphase separation were successfully used as on-chip etch masks for pattern transfer to the underlying silicon substrate. The molecular approach developed here affords significant advantages when compared to the more usual PDMS-OH brushes used.
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