Solvent Vapor Annealing of Block Copolymers in Confined Topographies: Commensurability Considerations for Nanolithography

Directed self-assembly of block copolymers for nanocircuitry fabrication

(2015) M.A. Morris   MICROELECTRONIC ENGINEERING

Two-Dimensional Pattern Formation Using Graphoepitaxy of PS-b-PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication

(2014) Hsinyu Tsai et al.   ACS Nano

Selective etching of polylactic acid in poly(styrene)-block-poly(d,l)lactide diblock copolymer for nanoscale patterning

(2014) Cian Cummins et al.   JOURNAL OF APPLIED POLYMER SCIENCE

Graphoepitaxial Directed Self-Assembly of Polystyrene-Block-Polydimethylsiloxane Block Copolymer on Substrates Functionalized with Hexamethyldisilazane to Fabricate Nanoscale Silicon Patterns

(2014) Dipu Borah et al.   Advanced Materials Interfaces

Sub-10 nm Feature Size PS-b-PDMS Block Copolymer Structures Fabricated by a Microwave-Assisted Solvothermal Process

(2013) Dipu Borah et al.   ACS Applied Materials & Interfaces

Fabrication of Ordered, Large Scale, Horizontally-Aligned Si Nanowire Arrays Based on an In Situ Hard Mask Block Copolymer Approach

(2013) Tandra Ghoshal et al.   ADVANCED MATERIALS

Achieving structural control with thin polystyrene-b-polydimethylsiloxane block copolymer films: The complex relationship of interface chemistry, annealing methodology and process conditions

(2013) Benjamin M.D. O’Driscoll et al.   EUROPEAN POLYMER JOURNAL

Solvent Vapor Annealing of Block Polymer Thin Films

(2013) Christophe Sinturel et al.   MACROMOLECULES

Block Copolymer Lithography

(2013) Christopher M. Bates et al.   MACROMOLECULES

Directed self-assembly of block copolymers for next generation nanolithography

(2013) Seong-Jun Jeong et al.   Materials Today

Pattern transfer using block copolymers

(2013) X. Gu et al.   PHILOSOPHICAL TRANSACTIONS OF THE ROYAL SOCIETY A-MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES

Self-assembly of polystyrene-block-poly(4-vinylpyridine) block copolymer on molecularly functionalized silicon substrates: fabrication of inorganic nanostructured etchmask for lithographic use

(2013) C. Cummins et al.   Journal of Materials Chemistry C

Selective Sidewall Wetting of Polymer Blocks in Hydrogen Silsesquioxane Directed Self-Assembly of PS-b-PDMS

(2012) Richard G. Hobbs et al.   ACS Applied Materials & Interfaces

Pattern Placement Accuracy in Block Copolymer Directed Self-Assembly Based on Chemical Epitaxy

(2012) Gregory S. Doerk et al.   ACS Nano

High Density and Large Area Arrays of Silicon Oxide Pillars with Tunable Domain Size for Mask Etch Applications

(2012) Xiaodan Gu et al.   ADVANCED MATERIALS

High Aspect Ratio Sub-15 nm Silicon Trenches From Block Copolymer Templates

(2012) Xiaodan Gu et al.   ADVANCED MATERIALS

Semiconductor Nanowire Fabrication by Bottom-Up and Top-Down Paradigms

(2012) Richard G. Hobbs et al.   CHEMISTRY OF MATERIALS

A general method for controlled nanopatterning of oxide dots: a microphase separated block copolymer platform

(2012) Tandra Ghoshal et al.   JOURNAL OF MATERIALS CHEMISTRY

Implementation of a chemo-epitaxy flow for directed self-assembly on 300-mm wafer processing equipment

(2012) Paulina A. Rincon Delgadillo   Journal of Micro-Nanolithography MEMS and MOEMS

Directed self-assembly of PS-b-PMMA block copolymer using HSQ lines for translational alignment

(2012) Dipu Borah et al.   Journal of Materials Chemistry C

Plasma etch technologies for the development of ultra-small feature size transistor devices

(2011) D Borah et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Block copolymer strategies for solar cell technology

(2011) Paul D. Topham et al.   JOURNAL OF POLYMER SCIENCE PART B-POLYMER PHYSICS

Self-assembled templates for the generation of arrays of 1-dimensional nanostructures: From molecules to devices

(2010) Richard A. Farrell et al.   JOURNAL OF COLLOID AND INTERFACE SCIENCE

CMOS compatible strategy based on selective atomic layer deposition of a hard mask for transferring block copolymer lithography patterns

(2010) G Gay et al.   NANOTECHNOLOGY

Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns

(2009) Joona Bang et al.   ADVANCED MATERIALS

Study on the Combined Effects of Solvent Evaporation and Polymer Flow upon Block Copolymer Self-Assembly and Alignment on Topographic Patterns

(2009) Thomas G. Fitzgerald et al.   LANGMUIR

Highly ordered palladium nanodots and nanowires from switchable block copolymer thin films

(2009) E Bhoje Gowd et al.   NANOTECHNOLOGY

Ordering of PS-b-P4VP on Patterned Silicon Surfaces

(2008) Soojin Park et al.   ACS Nano

Graphoepitaxy of Self-Assembled Block Copolymers on Two-Dimensional Periodic Patterned Templates

(2008) I. Bita et al.   SCIENCE