Design of efficient mono-aminosilane precursors for atomic layer deposition of SiO2 thin films

Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition

(2016) Guoyong Fang et al.   CHEMISTRY OF MATERIALS

Theoretical design and computational screening of precursors for atomic layer deposition

(2016) Guoyong Fang et al.   COORDINATION CHEMISTRY REVIEWS

Atomic Layer Deposition of Silicon Dioxide Using Aminosilanes Di-sec-butylaminosilane and Bis(tert-butylamino)silane with Ozone

(2016) Luis Fabián Peña et al.   Journal of Physical Chemistry C

Atomic layer deposition of diisopropylaminosilane on WO3(001) and W(110): a density functional theory study

(2016) Kyungtae Lee et al.   PHYSICAL CHEMISTRY CHEMICAL PHYSICS

Modeling Mechanism and Growth Reactions for New Nanofabrication Processes by Atomic Layer Deposition

(2015) Simon D. Elliott et al.   ADVANCED MATERIALS

Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2

(2015) Guo-Yong Fang et al.   CHEMICAL COMMUNICATIONS

Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride

(2015) Chaitanya Krishna Ande et al.   Journal of Physical Chemistry Letters

Designing high performance precursors for atomic layer deposition of silicon oxide

(2015) Anupama Mallikarjunan et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Effect of Reaction Mechanism on Precursor Exposure Time in Atomic Layer Deposition of Silicon Oxide and Silicon Nitride

(2014) Ciaran A. Murray et al.   ACS Applied Materials & Interfaces

Effect of amino ligand size of Si precursors on initial reaction with an –OH-terminated Si(001) surface for atomic layer deposition

(2014) Ji-Su Kim et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Initial Surface Reaction of Di-Isopropylaminosilane on a Fully Hydroxyl-Terminated Si (001) Surface

(2014) Jin-Hoon Yang et al.   JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY

Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

(2014) Matti Putkonen et al.   THIN SOLID FILMS

Initial reaction of silicon precursors with a varying number of dimethylamino ligands on a hydroxyl-terminated silicon (001) surface

(2013) Yong-Chan Jeong et al.   APPLIED SURFACE SCIENCE

Initial Reaction of Dimethylaluminum Isopropoxide with Hydrogen-Terminated Si (001) Surface Using Density Functional Theory

(2013) Dae-Hee Kim et al.   JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY

Rapid vapor deposition SiO2 thin film deposited at a low temperature using tris(tert-pentoxy)silanol and trimethyl-aluminum

(2013) Dong-won Choi et al.   MATERIALS CHEMISTRY AND PHYSICS

Rapid atomic layer deposition of silica nanolaminates: synergistic catalysis of Lewis/Brønsted acid sites and interfacial interactions

(2013) Guoyong Fang et al.   Nanoscale

High-Quality Thin SiO2Films Grown by Atomic Layer Deposition Using Tris(dimethylamino)silane (TDMAS) and Ozone

(2013) Lei Han et al.   ECS Journal of Solid State Science and Technology

Adsorption and surface reaction of bis-diethylaminosilane as a Si precursor on an OH-terminated Si (001) surface

(2012) Seung-Bin Baek et al.   APPLIED SURFACE SCIENCE

Surface Pseudorotation in Lewis-Base-Catalyzed Atomic Layer Deposition of SiO2: Static Transition State Search and Born–Oppenheimer Molecular Dynamics Simulation

(2012) Guoyong Fang et al.   Journal of Physical Chemistry C

Energy barriers for trimethylaluminum reaction with varying surface hydroxyl density

(2011) Dae-Hee Kim et al.   APPLIED SURFACE SCIENCE

Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition

(2011) G. Dingemans et al.   JOURNAL OF APPLIED PHYSICS

On the Mechanisms of SiO2 Thin-Film Growth by the Full Atomic Layer Deposition Process Using Bis(t-butylamino)silane on the Hydroxylated SiO2(001) Surface

(2011) Bo Han et al.   Journal of Physical Chemistry C

Growth and electrical properties of silicon oxide grown by atomic layer deposition using Bis(ethyl-methyl-amino)silane and ozone

(2011) Seok-Jun Won et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Atomic Layer Deposition and Properties of Silicon Oxide Thin Films Using Alternating Exposures to SiH2Cl2and O3

(2010) Won-Jun Lee et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

SiO[sub 2] Films Deposited by APCVD with a TEOS/Ozone Mixture and Its Application to the Gate Dielectric of TFTs

(2010) Jaehong Kim et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Atomic layer deposition of SiO2 from Tris(dimethylamino)silane and ozone by using temperature-controlled water vapor treatment

(2010) F. Hirose et al.   THIN SOLID FILMS

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS

On the Dissociative Chemisorption of Tris(dimethylamino)silane on Hydroxylated SiO2(001) Surface

(2009) Jiaye Li et al.   Journal of Physical Chemistry C

A Practical, Self-Catalytic, Atomic Layer Deposition of Silicon Dioxide

(2008) Julien Bachmann et al.   ANGEWANDTE CHEMIE-INTERNATIONAL EDITION

Rapid SiO2Atomic Layer Deposition Using Tris(tert-pentoxy)silanol

(2008) B. B. Burton et al.   CHEMISTRY OF MATERIALS

Atomic Layer Deposition of Silicon Oxide Thin Films by Alternating Exposures to Si[sub 2]Cl[sub 6] and O[sub 3]

(2008) Seung-Won Lee et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Bis(diethylamino) Silane as the Silicon Precursor in the Atomic Layer Deposition of HfSiO[sub x]

(2008) Rajesh Katamreddy et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Low-temperature deposition of silicon oxide and silicon nitride by reactive magnetron sputtering

(2008) Luís da Silva Zambom et al.   MICROELECTRONICS JOURNAL