SiO[sub 2] Films Deposited by APCVD with a TEOS/Ozone Mixture and Its Application to the Gate Dielectric of TFTs

标题
SiO[sub 2] Films Deposited by APCVD with a TEOS/Ozone Mixture and Its Application to the Gate Dielectric of TFTs
作者
关键词
-
出版物
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume 157, Issue 2, Pages H182
出版商
The Electrochemical Society
发表日期
2010-01-01
DOI
10.1149/1.3267039

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