High-Quality Thin SiO2Films Grown by Atomic Layer Deposition Using Tris(dimethylamino)silane (TDMAS) and Ozone

Lateral heating of SiO2/Si: Interfacial Si structure change causing tunneling current reduction

(2012) Zhi Chen et al.   APPLIED PHYSICS LETTERS

Low temperature silicon dioxide by thermal atomic layer deposition: Investigation of material properties

(2010) D. Hiller et al.   JOURNAL OF APPLIED PHYSICS

The Interfacial Quality of HfO[sub 2] on Silicon with Different Thicknesses of the Chemical Oxide Interfacial Layer

(2010) Shibin Li et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS

On the Dissociative Chemisorption of Tris(dimethylamino)silane on Hydroxylated SiO2(001) Surface

(2009) Jiaye Li et al.   Journal of Physical Chemistry C

SiO2 Atomic Layer Deposition Using Tris(dimethylamino)silane and Hydrogen Peroxide Studied by in Situ Transmission FTIR Spectroscopy

(2009) B. B. Burton et al.   Journal of Physical Chemistry C

A Practical, Self-Catalytic, Atomic Layer Deposition of Silicon Dioxide

(2008) Julien Bachmann et al.   ANGEWANDTE CHEMIE-INTERNATIONAL EDITION

Silicon nanowire tunneling field-effect transistors

(2008) M. T. Björk et al.   APPLIED PHYSICS LETTERS