Growth and electrical properties of silicon oxide grown by atomic layer deposition using Bis(ethyl-methyl-amino)silane and ozone

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(2010) P. S. Andry et al.   IBM JOURNAL OF RESEARCH AND DEVELOPMENT

High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal–Organic Silicon Precursor and Oxygen Radical

(2010) Seok-Jun Won et al.   IEEE ELECTRON DEVICE LETTERS

A model-based approach to compensate for the dynamics convolution effect on nanomechanical property measurement

(2010) Zhonghua Xu et al.   JOURNAL OF APPLIED PHYSICS

Sulfur-Induced PtSi:C/Si:C Schottky Barrier Height Lowering for Realizing N-Channel FinFETs With Reduced External Resistance

(2009) R.T.-P. Lee et al.   IEEE ELECTRON DEVICE LETTERS

A Practical, Self-Catalytic, Atomic Layer Deposition of Silicon Dioxide

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What Originates the Dielectric Permittivity of Silicate-Silsesquioxane Hybrid Thin Films?

(2008) Chang-Sic Kim et al.   JOURNAL OF PHYSICAL CHEMISTRY B

Bis(diethylamino) Silane as the Silicon Precursor in the Atomic Layer Deposition of HfSiO[sub x]

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