Rapid vapor deposition SiO2 thin film deposited at a low temperature using tris(tert-pentoxy)silanol and trimethyl-aluminum

标题
Rapid vapor deposition SiO2 thin film deposited at a low temperature using tris(tert-pentoxy)silanol and trimethyl-aluminum
作者
关键词
-
出版物
MATERIALS CHEMISTRY AND PHYSICS
Volume 142, Issue 2-3, Pages 614-618
出版商
Elsevier BV
发表日期
2013-08-24
DOI
10.1016/j.matchemphys.2013.08.004

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