Impact of oxygen content on phase constitution and ferroelectric behavior of hafnium oxide thin films deposited by reactive high-power impulse magnetron sputtering

Impact of vacancies and impurities on ferroelectricity in PVD- and ALD-grown HfO2 films

(2021) Lutz Baumgarten et al.   APPLIED PHYSICS LETTERS

Metal Nitride Electrode Stress and Chemistry Effects on Phase and Polarization Response in Ferroelectric Hf 0.5 Zr 0.5 O 2 Thin Films

(2021) Shelby S. Fields et al.   Advanced Materials Interfaces

Intrinsic Defect Limit to the Growth of Orthorhombic HfO 2 and (Hf,Zr)O 2 with Strong Ferroelectricity: First‐Principles Insights

(2021) Jinchen Wei et al.   ADVANCED FUNCTIONAL MATERIALS

Room-temperature deposition of ferroelectric HfO2-based films by the sputtering method

(2020) Takanori Mimura et al.   APPLIED PHYSICS LETTERS

Physical chemistry of the TiN/Hf0.5Zr0.5O2 interface

(2020) W. Hamouda et al.   JOURNAL OF APPLIED PHYSICS

Phase-Exchange-Driven Wake-Up and Fatigue in Ferroelectric Hafnium Zirconium Oxide Films

(2020) Shelby S. Fields et al.   ACS Applied Materials & Interfaces

Compositional dependence of crystallization temperatures and phase evolution in hafnia-zirconia (HfxZr1−x)O2 thin films

(2020) H. Alex Hsain et al.   APPLIED PHYSICS LETTERS

Enhanced ferroelectricity in ultrathin films grown directly on silicon

(2020) Suraj S. Cheema et al.   NATURE

Compositional dependence of linear and nonlinear optical response in crystalline hafnium zirconium oxide thin films

(2020) Jon F. Ihlefeld et al.   JOURNAL OF APPLIED PHYSICS

Impact of oxygen vacancy on the ferroelectric properties of lanthanum-doped hafnium oxide

(2020) Damir R. Islamov et al.   APPLIED PHYSICS LETTERS

Composition-Dependent Ferroelectric Properties in Sputtered HfXZr1−XO2 Thin Films

(2019) Qing Luo et al.   IEEE ELECTRON DEVICE LETTERS

Ferroelectricity in YO1.5-HfO2 films around 1 μm in thickness

(2019) Takanori Mimura et al.   APPLIED PHYSICS LETTERS

Origin of Ferroelectric Phase in Undoped HfO 2 Films Deposited by Sputtering

(2019) Terence Mittmann et al.   Advanced Materials Interfaces

Evolution of ferroelectric HfO2 in ultrathin region down to 3 nm

(2018) Xuan Tian et al.   APPLIED PHYSICS LETTERS

Effect of Annealing Ferroelectric HfO2 Thin Films: In Situ, High Temperature X-Ray Diffraction

(2018) Min Hyuk Park et al.   Advanced Electronic Materials

Thermodynamic and Kinetic Origins of Ferroelectricity in Fluorite Structure Oxides

(2018) Min Hyuk Park et al.   Advanced Electronic Materials

Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)

(2017) André Anders   JOURNAL OF APPLIED PHYSICS

Surface and grain boundary energy as the key enabler of ferroelectricity in nanoscale hafnia-zirconia: a comparison of model and experiment

(2017) Min Hyuk Park et al.   Nanoscale

Preparation and characterization of ferroelectric Hf0.5Zr0.5O2 thin films grown by reactive sputtering

(2017) Young Hwan Lee et al.   NANOTECHNOLOGY

An extensive study of the influence of dopants on the ferroelectric properties of HfO2

(2017) S. Starschich et al.   Journal of Materials Chemistry C

Impact of mechanical stress on ferroelectricity in (Hf0.5Zr0.5)O2 thin films

(2016) Takahisa Shiraishi et al.   APPLIED PHYSICS LETTERS

Scaling Effects in Perovskite Ferroelectrics: Fundamental Limits and Process-Structure-Property Relations

(2016) Jon F. Ihlefeld et al.   JOURNAL OF THE AMERICAN CERAMIC SOCIETY

Electronic properties of hafnium oxide: A contribution from defects and traps

(2016) Vladimir A. Gritsenko et al.   PHYSICS REPORTS-REVIEW SECTION OF PHYSICS LETTERS

Ferroelectricity in undoped-HfO2 thin films induced by deposition temperature control during atomic layer deposition

(2016) K. D. Kim et al.   Journal of Materials Chemistry C

Structural Changes Underlying Field-Cycling Phenomena in Ferroelectric HfO2Thin Films

(2016) Everett D. Grimley et al.   Advanced Electronic Materials

Contribution of oxygen vacancies to the ferroelectric behavior of Hf0.5Zr0.5O2 thin films

(2015) Takao Shimizu et al.   APPLIED PHYSICS LETTERS

The origin of ferroelectricity in Hf1−xZrxO2: A computational investigation and a surface energy model

(2015) R. Materlik et al.   JOURNAL OF APPLIED PHYSICS

Chemical solution deposition of ferroelectric yttrium-doped hafnium oxide films on platinum electrodes

(2014) S. Starschich et al.   APPLIED PHYSICS LETTERS

Origin of traps and charge transport mechanism in hafnia

(2014) D. R. Islamov et al.   APPLIED PHYSICS LETTERS

The origin of 2.7 eV luminescence and 5.2 eV excitation band in hafnium oxide

(2014) T. V. Perevalov et al.   APPLIED PHYSICS LETTERS

Study on the degradation mechanism of the ferroelectric properties of thin Hf0.5Zr0.5O2 films on TiN and Ir electrodes

(2014) Min Hyuk Park et al.   APPLIED PHYSICS LETTERS

Towards forming-free resistive switching in oxygen engineered HfO2−x

(2014) S. U. Sharath et al.   APPLIED PHYSICS LETTERS

Incipient Ferroelectricity in Al-Doped HfO2 Thin Films

(2012) Stefan Mueller et al.   ADVANCED FUNCTIONAL MATERIALS

Co-sputtering yttrium into hafnium oxide thin films to produce ferroelectric properties

(2012) T. Olsen et al.   APPLIED PHYSICS LETTERS

Ferroelectricity in Simple Binary ZrO2 and HfO2

(2012) Johannes Müller et al.   NANO LETTERS

Impact of layer thickness on the ferroelectric behaviour of silicon doped hafnium oxide thin films

(2012) Ekaterina Yurchuk et al.   THIN SOLID FILMS

Ferroelectricity in Gd-Doped HfO2Thin Films

(2012) S. Mueller et al.   ECS Journal of Solid State Science and Technology

The Impact of Carbon Concentration on the Crystalline Phase and Dielectric Constant of Atomic Layer Deposited HfO2Films on Ge Substrate

(2012) Hyung-Suk Jung et al.   ECS Journal of Solid State Science and Technology

Ferroelectricity in hafnium oxide thin films

(2011) T. S. Böscke et al.   APPLIED PHYSICS LETTERS

Investigation of oxygen-related defects and the electrical properties of atomic layer deposited HfO2 films using electron energy-loss spectroscopy

(2011) Jae Hyuck Jang et al.   JOURNAL OF APPLIED PHYSICS

Ferroelectricity in yttrium-doped hafnium oxide

(2011) J. Müller et al.   JOURNAL OF APPLIED PHYSICS

Gate Oxides Beyond SiO2

(2011) Darrell G. Schlom et al.   MRS BULLETIN