Impact of layer thickness on the ferroelectric behaviour of silicon doped hafnium oxide thin films

标题
Impact of layer thickness on the ferroelectric behaviour of silicon doped hafnium oxide thin films
作者
关键词
-
出版物
THIN SOLID FILMS
Volume 533, Issue -, Pages 88-92
出版商
Elsevier BV
发表日期
2012-12-20
DOI
10.1016/j.tsf.2012.11.125

向作者/读者发起求助以获取更多资源

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started