Effect of low thermal budget annealing on surface passivation of silicon by ALD based aluminum oxide films

标题
Effect of low thermal budget annealing on surface passivation of silicon by ALD based aluminum oxide films
作者
关键词
-
出版物
PHYSICAL CHEMISTRY CHEMICAL PHYSICS
Volume 16, Issue 39, Pages 21804-21811
出版商
Royal Society of Chemistry (RSC)
发表日期
2015-05-29
DOI
10.1039/c4cp03430a

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