Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films

标题
Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
作者
关键词
-
出版物
Beilstein Journal of Nanotechnology
Volume 4, Issue -, Pages 732-742
出版商
Beilstein Institut
发表日期
2013-11-08
DOI
10.3762/bjnano.4.83

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