Deposition Temperature and Thermal Annealing Effects on the Electrical Characteristics of Atomic Layer Deposited Al2O3 Films on Silicon

出版年份 2011 全文链接

标题

作者

关键词

出版物

Volume 158, Issue 5, Pages G108

出版商

The Electrochemical Society

发表日期

2011-03-17

DOI

10.1149/1.3559458

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