Role of dislocations and carrier concentration in limiting the electron mobility of InN films grown by plasma assisted molecular beam epitaxy
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Title
Role of dislocations and carrier concentration in limiting the electron mobility of InN films grown by plasma assisted molecular beam epitaxy
Authors
Keywords
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Journal
JOURNAL OF APPLIED PHYSICS
Volume 123, Issue 1, Pages 015701
Publisher
AIP Publishing
Online
2018-01-03
DOI
10.1063/1.5008903
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