Role of dislocations and carrier concentration in limiting the electron mobility of InN films grown by plasma assisted molecular beam epitaxy

Title
Role of dislocations and carrier concentration in limiting the electron mobility of InN films grown by plasma assisted molecular beam epitaxy
Authors
Keywords
-
Journal
JOURNAL OF APPLIED PHYSICS
Volume 123, Issue 1, Pages 015701
Publisher
AIP Publishing
Online
2018-01-03
DOI
10.1063/1.5008903

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