Progress and perspective on different strategies to achieve wake-up-free ferroelectric hafnia and zirconia-based thin films

In situ heating studies on temperature-induced phase transitions in epitaxial Hf0.5Zr0.5O2/La0.67Sr0.33MnO3 heterostructures

(2021) Pavan Nukala et al.   APPLIED PHYSICS LETTERS

An Overview of Ferroelectric Hafnia and Epitaxial Growth

(2021) Jing Cao et al.   Physica Status Solidi-Rapid Research Letters

Reversible oxygen migration and phase transitions in hafnia-based ferroelectric devices

(2021) Pavan Nukala et al.   SCIENCE

Advances in Dielectric Thin Films for Energy Storage Applications, Revealing the Promise of Group IV Binary Oxides

(2021) José P. B. Silva et al.   ACS Energy Letters

Intrinsic Defect Limit to the Growth of Orthorhombic HfO 2 and (Hf,Zr)O 2 with Strong Ferroelectricity: First‐Principles Insights

(2021) Jinchen Wei et al.   ADVANCED FUNCTIONAL MATERIALS

Domains and domain dynamics in fluorite-structured ferroelectrics

(2021) Dong Hyun Lee et al.   Applied Physics Reviews

Wake-up Free Ferroelectric Rhombohedral Phase in Epitaxially Strained ZrO2 Thin Films

(2021) José P. B. Silva et al.   ACS Applied Materials & Interfaces

Stabilization of thick, rhombohedral Hf0.5Zr0.5O2 epilayer on c-plane ZnO

(2021) Maoyuan Zheng et al.   APPLIED PHYSICS LETTERS

High polarization and wake-up free ferroelectric characteristics in ultrathin Hf0.5Zr0.5O2 devices by control of oxygen-deficient layer

(2021) Manoj Yadav et al.   NANOTECHNOLOGY

Piezoelectricity in hafnia

(2021) Sangita Dutta et al.   Nature Communications

One Nanometer HfO 2 ‐Based Ferroelectric Tunnel Junctions on Silicon

(2021) Suraj S. Cheema et al.   Advanced Electronic Materials

Possible electrochemical origin of ferroelectricity in HfO2 thin films

(2020) Maya D. Glinchuk et al.   JOURNAL OF ALLOYS AND COMPOUNDS

Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights

(2020) Mattia Halter et al.   ACS Applied Materials & Interfaces

Domain-Matching Epitaxy of Ferroelectric Hf0.5Zr0.5O2(111) on La2/3Sr1/3MnO3(001)

(2020) Saul Estandía et al.   CRYSTAL GROWTH & DESIGN

Enhanced ferroelectricity in ultrathin films grown directly on silicon

(2020) Suraj S. Cheema et al.   NATURE

Stability of ferroelectric and antiferroelectric hafnium–zirconium oxide thin films

(2020) Kisung Chae et al.   JOURNAL OF APPLIED PHYSICS

Scale-free ferroelectricity induced by flat phonon bands in HfO2

(2020) Hyun-Jae Lee et al.   SCIENCE

Effects of Strain and Film Thickness on the Stability of the Rhombohedral Phase of HfO2

(2020) Yuke Zhang et al.   Physical Review Applied

Defect Engineering to Achieve Wake‐up Free HfO 2 ‐Based Ferroelectrics

(2020) Alireza Kashir et al.   ADVANCED ENGINEERING MATERIALS

Fatigue and retention in the growth window of ferroelectric Hf0.5Zr0.5O2 thin films

(2020) Jike Lyu et al.   APPLIED PHYSICS LETTERS

Impact of oxygen vacancy on the ferroelectric properties of lanthanum-doped hafnium oxide

(2020) Damir R. Islamov et al.   APPLIED PHYSICS LETTERS

A key piece of the ferroelectric hafnia puzzle

(2020) Beatriz Noheda et al.   SCIENCE

Guidelines for the stabilization of a polar rhombohedral phase in epitaxial Hf0.5Zr0.5O2 thin films

(2020) Pavan Nukala et al.   FERROELECTRICS

Epitaxial Integration on Si(001) of Ferroelectric Hf0.5Zr0.5O2 Capacitors with High Retention and Endurance

(2019) Jike Lyu et al.   ACS Applied Materials & Interfaces

Mitigating wakeup effect and improving endurance of ferroelectric HfO2-ZrO2 thin films by careful La-doping

(2019) Maxim G. Kozodaev et al.   JOURNAL OF APPLIED PHYSICS

Unveiling the double-well energy landscape in a ferroelectric layer

(2019) Michael Hoffmann et al.   NATURE

Composition-Dependent Ferroelectric Properties in Sputtered HfXZr1−XO2 Thin Films

(2019) Qing Luo et al.   IEEE ELECTRON DEVICE LETTERS

Ferroelectricity of HfxZr1−xO2 thin films fabricated by 300 °C low temperature process with plasma-enhanced atomic layer deposition

(2019) Takashi Onaya et al.   MICROELECTRONIC ENGINEERING

Magnetic Tunnel Junctions Based on Ferroelectric Hf0.5Zr0.5O2 Tunnel Barriers

(2019) Yingfen Wei et al.   Physical Review Applied

Dramatic impact of pressure and annealing temperature on the properties of sputtered ferroelectric HZO layers

(2019) Jordan Bouaziz et al.   APL Materials

A comprehensive study on the mechanism of ferroelectric phase formation in hafnia-zirconia nanolaminates and superlattices

(2019) Min Hyuk Park et al.   Applied Physics Reviews

Effect of film thickness on the ferroelectric and dielectric properties of low-temperature (400 °C) Hf0.5Zr0.5O2 films

(2018) Si Joon Kim et al.   APPLIED PHYSICS LETTERS

On the relationship between field cycling and imprint in ferroelectric Hf0.5Zr0.5O2

(2018) F. P. G. Fengler et al.   JOURNAL OF APPLIED PHYSICS

Robust ferroelectricity in epitaxial Hf1/2Zr1/2O2 thin films

(2018) J. Lyu et al.   APPLIED PHYSICS LETTERS

Ferroelectric Hf0.5Zr0.5O2 Thin Films: A Review of Recent Advances

(2018) Si Joon Kim et al.   JOM

Review and perspective on ferroelectric HfO2-based thin films for memory applications

(2018) Min Hyuk Park et al.   MRS Communications

A rhombohedral ferroelectric phase in epitaxially strained Hf0.5Zr0.5O2 thin films

(2018) Yingfen Wei et al.   NATURE MATERIALS

A comprehensive study on the structural evolution of HfO2 thin films doped with various dopants

(2017) M. H. Park et al.   Journal of Materials Chemistry C

The demonstration of significant ferroelectricity in epitaxial Y-doped HfO2 film

(2016) Takao Shimizu et al.   Scientific Reports

Contribution of oxygen vacancies to the ferroelectric behavior of Hf0.5Zr0.5O2 thin films

(2015) Takao Shimizu et al.   APPLIED PHYSICS LETTERS

Wake-up effects in Si-doped hafnium oxide ferroelectric thin films

(2013) Dayu Zhou et al.   APPLIED PHYSICS LETTERS

Incipient Ferroelectricity in Al-Doped HfO2 Thin Films

(2012) Stefan Mueller et al.   ADVANCED FUNCTIONAL MATERIALS

Ferroelectricity in Simple Binary ZrO2 and HfO2

(2012) Johannes Müller et al.   NANO LETTERS

Ferroelectricity in Gd-Doped HfO2Thin Films

(2012) S. Mueller et al.   ECS Journal of Solid State Science and Technology