Contribution of oxygen vacancies to the ferroelectric behavior of Hf0.5Zr0.5O2 thin films
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Title
Contribution of oxygen vacancies to the ferroelectric behavior of Hf0.5Zr0.5O2 thin films
Authors
Keywords
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Journal
APPLIED PHYSICS LETTERS
Volume 106, Issue 11, Pages 112904
Publisher
AIP Publishing
Online
2015-03-19
DOI
10.1063/1.4915336
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