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Title
Toward Thick Piezoelectric HfO
2
‐Based Films
Authors
Keywords
-
Journal
Physica Status Solidi-Rapid Research Letters
Volume 14, Issue 3, Pages 1900626
Publisher
Wiley
Online
2019-12-02
DOI
10.1002/pssr.201900626
References
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- (2019) Aleksander Matavž et al. Applied Materials Today
- Lanthanum-Doped Hafnium Oxide: A Robust Ferroelectric Material
- (2018) Uwe Schroeder et al. INORGANIC CHEMISTRY
- Polarization switching behavior of Hf–Zr–O ferroelectric ultrathin films studied through coercive field characteristics
- (2018) Shinji Migita et al. JAPANESE JOURNAL OF APPLIED PHYSICS
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- (2018) Tanja Pečnik et al. JOURNAL OF ALLOYS AND COMPOUNDS
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- Doped ZrO2 for future lead free piezoelectric devices
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- Al-, Y-, and La-doping effects favoring intrinsic and field induced ferroelectricity in HfO2: A first principles study
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- Effect of Annealing Ferroelectric HfO2 Thin Films: In Situ, High Temperature X-Ray Diffraction
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- Genuinely Ferroelectric Sub-1-Volt-Switchable Nanodomains in HfxZr(1–x)O2 Ultrathin Capacitors
- (2018) Igor Stolichnov et al. ACS Applied Materials & Interfaces
- High dielectric permittivity of HfO2-based films with (La,Bi,Nb) substitution
- (2018) Shingo Yoneda et al. JAPANESE JOURNAL OF APPLIED PHYSICS
- Crystallization behavior and ferroelectric property of HfO2–ZrO2 films fabricated by chemical solution deposition
- (2018) Shuhei Nakayama et al. JAPANESE JOURNAL OF APPLIED PHYSICS
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- Effect of Ce doping on the structure and optical properties of HfO2 films by the Pechini-type sol–gel method
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- A rhombohedral ferroelectric phase in epitaxially strained Hf0.5Zr0.5O2 thin films
- (2018) Yingfen Wei et al. NATURE MATERIALS
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- (2018) Justin C. Wong et al. PROCEEDINGS OF THE IEEE
- Regulating crystal structure and ferroelectricity in Sr doped HfO2 thin films fabricated by metallo-organic decomposition
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- Surface and grain boundary energy as the key enabler of ferroelectricity in nanoscale hafnia-zirconia: a comparison of model and experiment
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- Enhanced pyroelectric and piezoelectric properties of PZT with aligned porosity for energy harvesting applications
- (2017) Yan Zhang et al. Journal of Materials Chemistry A
- An extensive study of the influence of dopants on the ferroelectric properties of HfO2
- (2017) S. Starschich et al. Journal of Materials Chemistry C
- Si Doped Hafnium Oxide-A “Fragile” Ferroelectric System
- (2017) Claudia Richter et al. Advanced Electronic Materials
- Stabilization of metastable phases in hafnia owing to surface energy effects
- (2016) Rohit Batra et al. APPLIED PHYSICS LETTERS
- Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
- (2016) A. G. Chernikova et al. APPLIED PHYSICS LETTERS
- Ferroelectricity and Antiferroelectricity of Doped Thin HfO2-Based Films
- (2015) Min Hyuk Park et al. ADVANCED MATERIALS
- Growth of epitaxial orthorhombic YO1.5-substituted HfO2 thin film
- (2015) Takao Shimizu et al. APPLIED PHYSICS LETTERS
- Ferroelectricity in undoped hafnium oxide
- (2015) Patrick Polakowski et al. APPLIED PHYSICS LETTERS
- On the structural origins of ferroelectricity in HfO2 thin films
- (2015) Xiahan Sang et al. APPLIED PHYSICS LETTERS
- The origin of ferroelectricity in Hf1−xZrxO2: A computational investigation and a surface energy model
- (2015) R. Materlik et al. JOURNAL OF APPLIED PHYSICS
- Chemical solution deposition of ferroelectric yttrium-doped hafnium oxide films on platinum electrodes
- (2014) S. Starschich et al. APPLIED PHYSICS LETTERS
- Impact of different dopants on the switching properties of ferroelectric hafniumoxide
- (2014) Uwe Schroeder et al. JAPANESE JOURNAL OF APPLIED PHYSICS
- Chemical solution growth of ferroelectric oxide thin films and nanostructures
- (2013) Nazanin Bassiri-Gharb et al. CHEMICAL SOCIETY REVIEWS
- Incipient Ferroelectricity in Al-Doped HfO2 Thin Films
- (2012) Stefan Mueller et al. ADVANCED FUNCTIONAL MATERIALS
- Impact of layer thickness on the ferroelectric behaviour of silicon doped hafnium oxide thin films
- (2012) Ekaterina Yurchuk et al. THIN SOLID FILMS
- Phase transitions in ferroelectric silicon doped hafnium oxide
- (2011) T. S. Böscke et al. APPLIED PHYSICS LETTERS
- Ferroelectricity in hafnium oxide thin films
- (2011) T. S. Böscke et al. APPLIED PHYSICS LETTERS
- Low-Energy Path to Dense HfO2Thin Films with Aqueous Precursor
- (2011) Kai Jiang et al. CHEMISTRY OF MATERIALS
- Ferroelectricity in yttrium-doped hafnium oxide
- (2011) J. Müller et al. JOURNAL OF APPLIED PHYSICS
- Cubic-Structured $\hbox{HfO}_{2}$ With Optimized Doping of Lanthanum for Higher Dielectric Constant
- (2009) Wei He et al. IEEE ELECTRON DEVICE LETTERS
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