Integration of High-kOxide on MoS2by Using Ozone Pretreatment for High-Performance MoS2Top-Gated Transistor with Thickness-Dependent Carrier Scattering Investigation
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Title
Integration of High-kOxide on MoS2by Using Ozone Pretreatment for High-Performance MoS2Top-Gated Transistor with Thickness-Dependent Carrier Scattering Investigation
Authors
Keywords
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Journal
Small
Volume 11, Issue 44, Pages 5932-5938
Publisher
Wiley
Online
2015-10-02
DOI
10.1002/smll.201501260
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