Understanding the discharge current behavior in reactive high power impulse magnetron sputtering of oxides
Published 2013 View Full Article
- Home
- Publications
- Publication Search
- Publication Details
Title
Understanding the discharge current behavior in reactive high power impulse magnetron sputtering of oxides
Authors
Keywords
-
Journal
JOURNAL OF APPLIED PHYSICS
Volume 113, Issue 13, Pages 133302
Publisher
AIP Publishing
Online
2013-04-04
DOI
10.1063/1.4799199
References
Ask authors/readers for more resources
Related references
Note: Only part of the references are listed.- Negative ion energy distributions in reactive HiPIMS
- (2012) M Bowes et al. JOURNAL OF PHYSICS D-APPLIED PHYSICS
- Current–voltage–time characteristics of the reactive Ar/O2 high power impulse magnetron sputtering discharge
- (2012) Fridrik Magnus et al. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
- High power impulse magnetron sputtering discharge
- (2012) J. T. Gudmundsson et al. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
- Understanding deposition rate loss in high power impulse magnetron sputtering: I. Ionization-driven electric fields
- (2012) N Brenning et al. PLASMA SOURCES SCIENCE & TECHNOLOGY
- Gas rarefaction and the time evolution of long high-power impulse magnetron sputtering pulses
- (2012) Chunqing Huo et al. PLASMA SOURCES SCIENCE & TECHNOLOGY
- Argon metastables in HiPIMS: time-resolved tunable diode-laser diagnostics
- (2012) C Vitelaru et al. PLASMA SOURCES SCIENCE & TECHNOLOGY
- Modeling reactive magnetron sputtering: Fixing the parameter set
- (2012) K. Strijckmans et al. SURFACE & COATINGS TECHNOLOGY
- Current-voltage-time characteristics of the reactive Ar/N2 high power impulse magnetron sputtering discharge
- (2011) F. Magnus et al. JOURNAL OF APPLIED PHYSICS
- Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide
- (2011) Montri Aiempanakit et al. SURFACE & COATINGS TECHNOLOGY
- Modelling of low energy ion sputtering from oxide surfaces
- (2010) T Kubart et al. JOURNAL OF PHYSICS D-APPLIED PHYSICS
- The evolution of the plasma potential in a HiPIMS discharge and its relationship to deposition rate
- (2010) Anurag Mishra et al. PLASMA SOURCES SCIENCE & TECHNOLOGY
- Short- and long-term plasma phenomena in a HiPIMS discharge
- (2010) P Poolcharuansin et al. PLASMA SOURCES SCIENCE & TECHNOLOGY
- Time evolution of ion energies in HIPIMS of chromium plasma discharge
- (2009) A Hecimovic et al. JOURNAL OF PHYSICS D-APPLIED PHYSICS
- Energy flux measurements in high power impulse magnetron sputtering
- (2009) Daniel Lundin et al. JOURNAL OF PHYSICS D-APPLIED PHYSICS
- Transition between the discharge regimes of high power impulse magnetron sputtering and conventional direct current magnetron sputtering
- (2009) Daniel Lundin et al. PLASMA SOURCES SCIENCE & TECHNOLOGY
- High power pulsed magnetron sputtering: A review on scientific and engineering state of the art
- (2009) K. Sarakinos et al. SURFACE & COATINGS TECHNOLOGY
- Formation of TiOx films produced by high-power pulsed magnetron sputtering
- (2008) Vítězslav Straňák et al. JOURNAL OF PHYSICS D-APPLIED PHYSICS
Create your own webinar
Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.
Create NowAsk a Question. Answer a Question.
Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.
Get Started