Understanding the discharge current behavior in reactive high power impulse magnetron sputtering of oxides
出版年份 2013 全文链接
标题
Understanding the discharge current behavior in reactive high power impulse magnetron sputtering of oxides
作者
关键词
-
出版物
JOURNAL OF APPLIED PHYSICS
Volume 113, Issue 13, Pages 133302
出版商
AIP Publishing
发表日期
2013-04-04
DOI
10.1063/1.4799199
参考文献
相关参考文献
注意：仅列出部分参考文献，下载原文获取全部文献信息。- Negative ion energy distributions in reactive HiPIMS
- (2012) M Bowes et al. JOURNAL OF PHYSICS D-APPLIED PHYSICS
- Current–voltage–time characteristics of the reactive Ar/O2 high power impulse magnetron sputtering discharge
- (2012) Fridrik Magnus et al. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
- High power impulse magnetron sputtering discharge
- (2012) J. T. Gudmundsson et al. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
- Understanding deposition rate loss in high power impulse magnetron sputtering: I. Ionization-driven electric fields
- (2012) N Brenning et al. PLASMA SOURCES SCIENCE & TECHNOLOGY
- Gas rarefaction and the time evolution of long high-power impulse magnetron sputtering pulses
- (2012) Chunqing Huo et al. PLASMA SOURCES SCIENCE & TECHNOLOGY
- Argon metastables in HiPIMS: time-resolved tunable diode-laser diagnostics
- (2012) C Vitelaru et al. PLASMA SOURCES SCIENCE & TECHNOLOGY
- Modeling reactive magnetron sputtering: Fixing the parameter set
- (2012) K. Strijckmans et al. SURFACE & COATINGS TECHNOLOGY
- Current-voltage-time characteristics of the reactive Ar/N2 high power impulse magnetron sputtering discharge
- (2011) F. Magnus et al. JOURNAL OF APPLIED PHYSICS
- Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide
- (2011) Montri Aiempanakit et al. SURFACE & COATINGS TECHNOLOGY
- Modelling of low energy ion sputtering from oxide surfaces
- (2010) T Kubart et al. JOURNAL OF PHYSICS D-APPLIED PHYSICS
- The evolution of the plasma potential in a HiPIMS discharge and its relationship to deposition rate
- (2010) Anurag Mishra et al. PLASMA SOURCES SCIENCE & TECHNOLOGY
- Short- and long-term plasma phenomena in a HiPIMS discharge
- (2010) P Poolcharuansin et al. PLASMA SOURCES SCIENCE & TECHNOLOGY
- Time evolution of ion energies in HIPIMS of chromium plasma discharge
- (2009) A Hecimovic et al. JOURNAL OF PHYSICS D-APPLIED PHYSICS
- Energy flux measurements in high power impulse magnetron sputtering
- (2009) Daniel Lundin et al. JOURNAL OF PHYSICS D-APPLIED PHYSICS
- Transition between the discharge regimes of high power impulse magnetron sputtering and conventional direct current magnetron sputtering
- (2009) Daniel Lundin et al. PLASMA SOURCES SCIENCE & TECHNOLOGY
- High power pulsed magnetron sputtering: A review on scientific and engineering state of the art
- (2009) K. Sarakinos et al. SURFACE & COATINGS TECHNOLOGY
- Formation of TiOx films produced by high-power pulsed magnetron sputtering
- (2008) Vítězslav Straňák et al. JOURNAL OF PHYSICS D-APPLIED PHYSICS
Create your own webinar
Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.
Create NowBecome a Peeref-certified reviewer
The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.
Get Started