Current–voltage–time characteristics of the reactive Ar/O2 high power impulse magnetron sputtering discharge

High power impulse magnetron sputtering discharge

(2012) J. T. Gudmundsson et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Reactive ionized physical vapor deposition of thin films

(2011) S. Konstantinidis et al.   EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS

Current-voltage-time characteristics of the reactive Ar/N2 high power impulse magnetron sputtering discharge

(2011) F. Magnus et al.   JOURNAL OF APPLIED PHYSICS

The ‘recycling trap’: a generalized explanation of discharge runaway in high-power impulse magnetron sputtering

(2011) A Anders et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Morphology of TiN thin films grown on SiO2 by reactive high power impulse magnetron sputtering

(2011) F. Magnus et al.   THIN SOLID FILMS

Hysteresis and process stability in reactive high power impulse magnetron sputtering of metal oxides

(2011) Montri Aiempanakit et al.   THIN SOLID FILMS

Compression and strong rarefaction in high power impulse magnetron sputtering discharges

(2010) David Horwat et al.   JOURNAL OF APPLIED PHYSICS

On the film density using high power impulse magnetron sputtering

(2010) Mattias Samuelsson et al.   SURFACE & COATINGS TECHNOLOGY

Fully dense, non-faceted 111-textured high power impulse magnetron sputtering TiN films grown in the absence of substrate heating and bias

(2010) M. Lattemann et al.   THIN SOLID FILMS

On the phase formation of titanium oxide films grown by reactive high power pulsed magnetron sputtering

(2009) J Alami et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Transition between the discharge regimes of high power impulse magnetron sputtering and conventional direct current magnetron sputtering

(2009) Daniel Lundin et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma

(2008) Joakim Andersson et al.   APPLIED PHYSICS LETTERS

Self-sputtering runaway in high power impulse magnetron sputtering: The role of secondary electrons and multiply charged metal ions

(2008) André Anders   APPLIED PHYSICS LETTERS

Magnetron sputter deposition: Linking discharge voltage with target properties

(2008) D. Depla et al.   THIN SOLID FILMS