Temperature dependence of negative bias under illumination stress and recovery in amorphous indium gallium zinc oxide thin film transistors
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Title
Temperature dependence of negative bias under illumination stress and recovery in amorphous indium gallium zinc oxide thin film transistors
Authors
Keywords
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Journal
APPLIED PHYSICS LETTERS
Volume 102, Issue 14, Pages 143506
Publisher
AIP Publishing
Online
2013-04-13
DOI
10.1063/1.4801762
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Note: Only part of the references are listed.- Oxide Semiconductor Thin-Film Transistors: A Review of Recent Advances
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- Impact of Plasma-Assisted Atomic-Layer-Deposited Gate Dielectric on Graphene Transistors
- (2011) Osama M. Nayfeh et al. IEEE ELECTRON DEVICE LETTERS
- Effect of annealing time on bias stress and light-induced instabilities in amorphous indium–gallium–zinc-oxide thin-film transistors
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- Electronic structure of oxygen-vacancy defects in amorphous In-Ga-Zn-O semiconductors
- (2011) Hyeon-Kyun Noh et al. PHYSICAL REVIEW B
- Comment on “Intrinsicn-type Behavior in Transparent Conducting Oxides: A Comparative Hybrid-Functional Study ofIn2O3,SnO2, and ZnO”
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- Photon-accelerated negative bias instability involving subgap states creation in amorphous In–Ga–Zn–O thin film transistor
- (2010) Himchan Oh et al. APPLIED PHYSICS LETTERS
- Light induced instabilities in amorphous indium–gallium–zinc–oxide thin-film transistors
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- Interface and bulk effects for bias—light-illumination instability in amorphous-In—Ga—Zn—O thin-film transistors
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- Intrinsic defects in ZnO calculated by screened exchange and hybrid density functionals
- (2010) S. J. Clark et al. PHYSICAL REVIEW B
- Present status of amorphous In–Ga–Zn–O thin-film transistors
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- Origins of threshold voltage shifts in room-temperature deposited and annealed a-In–Ga–Zn–O thin-film transistors
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- Fundamentals of zinc oxide as a semiconductor
- (2009) Anderson Janotti et al. REPORTS ON PROGRESS IN PHYSICS
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