Thermal conductivity and thermal boundary resistance of atomic layer deposited high-k dielectric aluminum oxide, hafnium oxide, and titanium oxide thin films on silicon
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Title
Thermal conductivity and thermal boundary resistance of atomic layer deposited high-k dielectric aluminum oxide, hafnium oxide, and titanium oxide thin films on silicon
Authors
Keywords
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Journal
APL Materials
Volume 6, Issue 5, Pages 058302
Publisher
AIP Publishing
Online
2018-05-14
DOI
10.1063/1.5021044
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