Thermal conductivity and thermal boundary resistance of atomic layer deposited high-k dielectric aluminum oxide, hafnium oxide, and titanium oxide thin films on silicon

标题
Thermal conductivity and thermal boundary resistance of atomic layer deposited high-k dielectric aluminum oxide, hafnium oxide, and titanium oxide thin films on silicon
作者
关键词
-
出版物
APL Materials
Volume 6, Issue 5, Pages 058302
出版商
AIP Publishing
发表日期
2018-05-14
DOI
10.1063/1.5021044

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