Aluminum dihydride complexes and their unexpected application in atomic layer deposition of titanium carbonitride films

Atomic Layer Deposition of Aluminum Metal Films Using a Thermally Stable Aluminum Hydride Reducing Agent

(2018) Kyle J. Blakeney et al.   CHEMISTRY OF MATERIALS

Thermal atomic layer deposition of tungsten carbide films from WCl6 and AlMe3

(2018) Kyle J. Blakeney et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Potential gold(I) precursors evaluated for atomic layer deposition

(2017) Maarit Mäkelä et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Thermal Atomic Layer Deposition of Titanium Films Using Titanium Tetrachloride and 2-Methyl-1,4-bis(trimethylsilyl)-2,5-cyclohexadiene or 1,4-Bis(trimethylsilyl)-1,4-dihydropyrazine

(2015) Joseph P. Klesko et al.   CHEMISTRY OF MATERIALS

Al capping layers for nondestructive x-ray photoelectron spectroscopy analyses of transition-metal nitride thin films

(2015) Grzegorz Greczynski et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Low-Temperature Atomic Layer Deposition of Copper Films Using Borane Dimethylamine as the Reducing Co-reagent

(2014) Lakmal C. Kalutarage et al.   CHEMISTRY OF MATERIALS

Generic trend of work functions in transition-metal carbides and nitrides

(2014) Michiko Yoshitake   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

The use of atomic layer deposition in advanced nanopatterning

(2014) A. J. M. Mackus et al.   Nanoscale

Recent Developments of Atomic Layer Deposition Processes for Metallization

(2013) Wei-Min Li   CHEMICAL VAPOR DEPOSITION

Precursors and chemistry for the atomic layer deposition of metallic first row transition metal films

(2013) Thomas J. Knisley et al.   COORDINATION CHEMISTRY REVIEWS

Metal ALD and pulsed CVD: Fundamental reactions and links with solution chemistry

(2013) David J.H. Emslie et al.   COORDINATION CHEMISTRY REVIEWS

Precursors as enablers of ALD technology: Contributions from University of Helsinki

(2013) Timo Hatanpää et al.   COORDINATION CHEMISTRY REVIEWS

Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

(2013) Ville Miikkulainen et al.   JOURNAL OF APPLIED PHYSICS

Controlling the Atomic Layer Deposition of Titanium Dioxide on Silicon: Dependence on Surface Termination

(2013) Stephen McDonnell et al.   Journal of Physical Chemistry C

Volatile and Thermally Stable Mid to Late Transition Metal Complexes Containing α-Imino Alkoxide Ligands, a New Strongly Reducing Coreagent, and Thermal Atomic Layer Deposition of Ni, Co, Fe, and Cr Metal Films

(2013) Lakmal C. Kalutarage et al.   JOURNAL OF THE AMERICAN CHEMICAL SOCIETY

Molybdenum Atomic Layer Deposition Using MoF6and Si2H6as the Reactants

(2011) D. Seghete et al.   CHEMISTRY OF MATERIALS

Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

(2011) H. B. Profijt et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Advances in the deposition chemistry of metal-containing thin films using gas phase processes

(2011) Naoufal Bahlawane et al.   Chemical Science

Tunable Work-Function Engineering of TiC–TiN Compound by Atomic Layer Deposition for Metal Gate Applications

(2010) Sanghun Jeon et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS