Understanding ion and atom fluxes during high-power impulse magnetron sputtering deposition of NbCx films from a compound target

Angular distribution of titanium ions and neutrals in high-power impulse magnetron sputtering discharges

(2023) M. Renner et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Non-reactive HiPIMS deposition of NbCx thin films: Effect of the target power density on structure-mechanical properties

(2022) A. Bahr et al.   SURFACE & COATINGS TECHNOLOGY

Deviations between film and target compositions induced by backscattered Ar during sputtering from M2-Al-C (M = Cr, Zr, and Hf) composite targets

(2022) Yu-Ping Chien et al.   SURFACE & COATINGS TECHNOLOGY

Target ion and neutral spread in high power impulse magnetron sputtering

(2022) H. Hajihoseini et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Modeling of high power impulse magnetron sputtering discharges with graphite target

(2021) H Eliasson et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Time-averaged and time-resolved ion fluxes related to reactive HiPIMS deposition of Ti-Al-N films

(2021) L. Zauner et al.   SURFACE & COATINGS TECHNOLOGY

Tribological performance of Nb-C thin films prepared by DC and HiPIMS

(2020) N. Sala et al.   MATERIALS LETTERS

Paradigm shift in thin-film growth by magnetron sputtering: From gas-ion to metal-ion irradiation of the growing film

(2019) Grzegorz Greczynski et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Controlling the B/Ti ratio of TiBx thin films grown by high-power impulse magnetron sputtering

(2018) Babak Bakhit et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Deposition rate enhancement in HiPIMS through the control of magnetic field and pulse configuration

(2018) Vasile Tiron et al.   SURFACE & COATINGS TECHNOLOGY

On three different ways to quantify the degree of ionization in sputtering magnetrons

(2018) Alexandre Butler et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Growth of NbC Thin Film Using CH4 as a Carbon Source and Reducing Agent

(2018) Kwan-Woo Kim et al.   Coatings

Dynamics of processes during the deposition of ZrO2 films by controlled reactive high-power impulse magnetron sputtering: A modelling study

(2017) Tomáš Kozák et al.   JOURNAL OF APPLIED PHYSICS

Composite targets in HiPIMS plasmas: Correlation of in-vacuum XPS characterization and optical plasma diagnostics

(2017) Vincent Layes et al.   JOURNAL OF APPLIED PHYSICS

Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)

(2017) André Anders   JOURNAL OF APPLIED PHYSICS

The use of niobium carbide (NbC) as cutting tools and for wear resistant tribosystems

(2015) Mathias Woydt et al.   INTERNATIONAL JOURNAL OF REFRACTORY METALS & HARD MATERIALS

On the HiPIMS benefits of multi-pulse operating mode

(2014) O Antonin et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Reactive sputtering of NbCx-based nanocomposite coatings: An up-scaling study

(2014) N. Nedfors et al.   SURFACE & COATINGS TECHNOLOGY

Tailoring mechanical properties and electrical conductivity of flexible niobium carbide nanocomposite thin films

(2014) Luis Yate et al.   RSC Advances

On the Evaluation of Corrosion Resistances of Amorphous Chromium-Carbon Thin-Films

(2013) Jonas Högström et al.   ELECTROCHIMICA ACTA

Structure-stress-resistivity relationship in WTi alloy ultra-thin and thin films prepared by magnetron sputtering

(2013) A. Le Priol et al.   JOURNAL OF APPLIED PHYSICS

Angle-resolved evolution of the composition of Cr–Al–C thin films deposited by sputtering of a compound target

(2013) Stanislav Mráz et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Tool steel coatings based on niobium carbide and carbonitride compounds

(2012) Rafael A. Mesquita et al.   SURFACE & COATINGS TECHNOLOGY

A non-stationary model for high power impulse magnetron sputtering discharges

(2011) Tomáš Kozák et al.   JOURNAL OF APPLIED PHYSICS

More evidence for azimuthal ion spin in HiPIMS discharges

(2011) P Poolcharuansin et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Structural, mechanical and electrical-contact properties of nanocrystalline-NbC/amorphous-C coatings deposited by magnetron sputtering

(2011) Nils Nedfors et al.   SURFACE & COATINGS TECHNOLOGY

Distance-dependent plasma composition and ion energy in high power impulse magnetron sputtering

(2010) Arutiun P Ehiasarian et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Deposition rates of high power impulse magnetron sputtering: Physics and economics

(2010) André Anders   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

A phenomenological equilibrium model applicable to high-power pulsed magnetron sputtering

(2010) J Vlček et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Transition probabilities of astrophysical interest in the niobium ions Nb$\mathsf{^+}$ and Nb$\mathsf{^{2+}}$

(2009) H. Nilsson et al.   ASTRONOMY & ASTROPHYSICS

Electron energy distributions and plasma parameters in high-power pulsed magnetron sputtering discharges

(2009) A D Pajdarová et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

High power pulsed magnetron sputtering: A review on scientific and engineering state of the art

(2009) K. Sarakinos et al.   SURFACE & COATINGS TECHNOLOGY

Experiment and simulation of the compositional evolution of Ti–B thin films deposited by sputtering of a compound target

(2008) Jörg Neidhardt et al.   JOURNAL OF APPLIED PHYSICS

Electron beam deposited VC and NbC thin films on titanium: Hardness and energy-dispersive X-ray diffraction study

(2007) D. Ferro et al.   SURFACE & COATINGS TECHNOLOGY

The physical reason for the apparently low deposition rate during high-power pulsed magnetron sputtering

(2007) Jens Emmerlich et al.   VACUUM