Deposition rate enhancement in HiPIMS through the control of magnetic field and pulse configuration

Published 2018 View Full Article

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Title
Deposition rate enhancement in HiPIMS through the control of magnetic field and pulse configuration
Authors
Keywords
HiPIMS, Plasma diagnostics, Deposition rate, Auxiliary magnetic field
Journal
SURFACE & COATINGS TECHNOLOGY
Volume 337, Issue -, Pages 484-491
Publisher
Elsevier BV
Online
2018-02-03
DOI
10.1016/j.surfcoat.2018.01.065

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