Regulating ferroelectricity in Hf0.5Zr0.5O2 thin films: Exploring the combined impact of oxygen vacancy and electrode stresses

Oxygen vacancy contributions to the electrical stress response and endurance of ferroelectric hafnium zirconium oxide thin films

(2023) Antik Mallick et al.   APPLIED PHYSICS LETTERS

Wake-up free ferroelectric hafnia-zirconia capacitors fabricated via vacuum-maintaining atomic layer deposition

(2023) H. Alex Hsain et al.   JOURNAL OF APPLIED PHYSICS

Effect of stress on fluorite-structured ferroelectric thin films for semiconductor devices

(2023) Younghwan Lee et al.   MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING

Fluorite‐Structured Ferroelectric and Antiferroelectric Materials: A Gateway of Miniaturized Electronic Devices

(2022) Faizan Ali et al.   ADVANCED FUNCTIONAL MATERIALS

Oxygen vacancy concentration as a function of cycling and polarization state in TiN/Hf0.5Zr0.5O2/TiN ferroelectric capacitors studied by x-ray photoemission electron microscopy

(2022) Wassim Hamouda et al.   APPLIED PHYSICS LETTERS

Hafnium Oxide (HfO 2 ) – A Multifunctional Oxide: A Review on the Prospect and Challenges of Hafnium Oxide in Resistive Switching and Ferroelectric Memories

(2022) Writam Banerjee et al.   Small

Characterization of Ferroelectric Characteristics for Hafnium Zirconium Oxide Capacitors with Refractory Electrodes

(2022) Yan-Kui Liang et al.   ECS Journal of Solid State Science and Technology

HfO2-based ferroelectrics: From enhancing performance, material design, to applications

(2022) Haiyan Chen et al.   Applied Physics Reviews

Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films

(2022) Shelby S. Fields et al.   Advanced Electronic Materials

Impact of oxygen content on phase constitution and ferroelectric behavior of hafnium oxide thin films deposited by reactive high-power impulse magnetron sputtering

(2022) Samantha T. Jaszewski et al.   ACTA MATERIALIA

A Perspective on ferroelectricity in hafnium oxide: Mechanisms and considerations regarding its stability and performance

(2022) Jon F. Ihlefeld et al.   APPLIED PHYSICS LETTERS

Impact of vacancies and impurities on ferroelectricity in PVD- and ALD-grown HfO2 films

(2021) Lutz Baumgarten et al.   APPLIED PHYSICS LETTERS

The Influence of Top and Bottom Metal Electrodes on Ferroelectricity of Hafnia

(2021) Yongsun Lee et al.   IEEE TRANSACTIONS ON ELECTRON DEVICES

Effect of annealing temperature on switching properties in Si-doped HfO2 films

(2021) Sanghyun Park et al.   JOURNAL OF APPLIED PHYSICS

Stabilization of the ferroelectric phase in Hf-based oxides by oxygen scavenging

(2021) Mingji Su et al.   Applied Physics Express

Effects of oxygen sources on properties of atomic-layer-deposited ferroelectric hafnium zirconium oxide thin films

(2021) Ah-Jin Cho et al.   CERAMICS INTERNATIONAL

On the wrong assignment of the XPS O1s signal at 531–532 eV attributed to oxygen vacancies in photo- and electro-catalysts for water splitting and other materials applications

(2021) Hicham Idriss   SURFACE SCIENCE

Enhanced ferroelectric polarization with less wake-up effect and improved endurance of Hf0.5Zr0.5O2 thin films by implementing W electrode

(2021) Dao Wang et al.   JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY

Physical chemistry of the TiN/Hf0.5Zr0.5O2 interface

(2020) W. Hamouda et al.   JOURNAL OF APPLIED PHYSICS

Compositional dependence of linear and nonlinear optical response in crystalline hafnium zirconium oxide thin films

(2020) Jon F. Ihlefeld et al.   JOURNAL OF APPLIED PHYSICS

Enhanced soft magnetic properties in CoZrTa(B) thin film with improving amorphous structure via introducing B atoms

(2020) Xiulan Xu et al.   AIP Advances

Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films

(2020) Ruben Alcala et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

A new approach to achieving strong ferroelectric properties in TiN/Hf0.5Zr0.5O2/TiN devices

(2020) Hyungwoo Kim et al.   NANOTECHNOLOGY

Origin of Ferroelectric Phase in Undoped HfO 2 Films Deposited by Sputtering

(2019) Terence Mittmann et al.   Advanced Materials Interfaces

Effects of growth orientations and epitaxial strains on phase stability of HfO2 thin films

(2019) Shi Liu et al.   PHYSICAL REVIEW MATERIALS

The effects of oxygen vacancies on ferroelectric phase transition of HfO2-based thin film from first-principle

(2019) Y. Zhou et al.   COMPUTATIONAL MATERIALS SCIENCE

Origin of the Intrinsic Ferroelectricity of HfO2 from ab Initio Molecular Dynamics

(2019) P. Fan et al.   Journal of Physical Chemistry C

Effect of oxygen vacancies on the ferroelectric Hf0.5Zr0.5O2 stabilization: DFT simulation

(2019) D.R. Islamov et al.   MICROELECTRONIC ENGINEERING

Improved Ferroelectric Switching Endurance of La-Doped Hf0.5Zr0.5O2 Thin Films

(2018) Anna G. Chernikova et al.   ACS Applied Materials & Interfaces

Ultrathin FeOOH Nanolayers with Abundant Oxygen Vacancies on BiVO4 Photoanodes for Efficient Water Oxidation

(2018) Beibei Zhang et al.   ANGEWANDTE CHEMIE-INTERNATIONAL EDITION

Effects of Capping Electrode on Ferroelectric Properties of Hf0.5Zr0.5O2 Thin Films

(2018) Rongrong Cao et al.   IEEE ELECTRON DEVICE LETTERS

Al-, Y-, and La-doping effects favoring intrinsic and field induced ferroelectricity in HfO2: A first principles study

(2018) Robin Materlik et al.   JOURNAL OF APPLIED PHYSICS

Electronic structure of stoichiometric and oxygen-deficient ferroelectric Hf0.5Zr0.5O2

(2018) T V Perevalov et al.   NANOTECHNOLOGY

Analysis of Performance Instabilities of Hafnia-Based Ferroelectrics Using Modulus Spectroscopy and Thermally Stimulated Depolarization Currents

(2018) Franz P. G. Fengler et al.   Advanced Electronic Materials

Frequency domain analysis of pyroelectric response in silicon-doped hafnium oxide (HfO2) thin films

(2018) C. Mart et al.   APPLIED PHYSICS LETTERS

Necklace-like Multishelled Hollow Spinel Oxides with Oxygen Vacancies for Efficient Water Electrolysis

(2018) Shengjie Peng et al.   JOURNAL OF THE AMERICAN CHEMICAL SOCIETY

Understanding the Roles of Oxygen Vacancies in Hematite-Based Photoelectrochemical Processes

(2018) Zhiliang Wang et al.   ANGEWANDTE CHEMIE-INTERNATIONAL EDITION

Thermodynamic and Kinetic Origins of Ferroelectricity in Fluorite Structure Oxides

(2018) Min Hyuk Park et al.   Advanced Electronic Materials

Effect of the film thickness on the crystal structure and ferroelectric properties of (Hf 0.5 Zr 0.5 )O 2 thin films deposited on various substrates

(2017) Takahisa Shiraishi et al.   MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING

Understanding the formation of the metastable ferroelectric phase in hafnia–zirconia solid solution thin films

(2017) Min Hyuk Park et al.   Nanoscale

Physical Mechanisms behind the Field-Cycling Behavior of HfO2 -Based Ferroelectric Capacitors

(2016) Milan Pešić et al.   ADVANCED FUNCTIONAL MATERIALS

Impact of mechanical stress on ferroelectricity in (Hf0.5Zr0.5)O2 thin films

(2016) Takahisa Shiraishi et al.   APPLIED PHYSICS LETTERS

Why Is FE–HfO2More Suitable Than PZT or SBT for Scaled Nonvolatile 1-T Memory Cell? A Retention Perspective

(2016) Nanbo Gong et al.   IEEE ELECTRON DEVICE LETTERS

On the structural origins of ferroelectricity in HfO2 thin films

(2015) Xiahan Sang et al.   APPLIED PHYSICS LETTERS

Effect of O2/Ar gas flow ratio on the optical properties and mechanical stress of sputtered HfO2 thin films

(2015) S. Jena et al.   THIN SOLID FILMS

Toward a multifunctional monolithic device based on pyroelectricity and the electrocaloric effect of thin antiferroelectric Hf x Zr 1−x O 2 films

(2015) Min Hyuk Park et al.   Nano Energy

The effects of crystallographic orientation and strain of thin Hf0.5Zr0.5O2 film on its ferroelectricity

(2014) Min Hyuk Park et al.   APPLIED PHYSICS LETTERS

Pathways towards ferroelectricity in hafnia

(2014) Tran Doan Huan et al.   PHYSICAL REVIEW B

Effect of forming gas annealing on the ferroelectric properties of Hf0.5Zr0.5O2 thin films with and without Pt electrodes

(2013) Min Hyuk Park et al.   APPLIED PHYSICS LETTERS

Evolution of phases and ferroelectric properties of thin Hf0.5Zr0.5O2 films according to the thickness and annealing temperature

(2013) Min Hyuk Park et al.   APPLIED PHYSICS LETTERS

Ten-Nanometer Ferroelectric $\hbox{Si:HfO}_{2}$ Films for Next-Generation FRAM Capacitors

(2012) Stefan Mueller et al.   IEEE ELECTRON DEVICE LETTERS

Ferroelectricity in Simple Binary ZrO2 and HfO2

(2012) Johannes Müller et al.   NANO LETTERS

Ferroelectricity in hafnium oxide thin films

(2011) T. S. Böscke et al.   APPLIED PHYSICS LETTERS