Ferroelectricity of pure HfOx in metal-ferroelectric-insulator-semiconductor stacks and its memory application
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Title
Ferroelectricity of pure HfOx in metal-ferroelectric-insulator-semiconductor stacks and its memory application
Authors
Keywords
Hafnium oxide (HfO, x, ), Ferroelectric memory, Metal-ferroelectric-insulator-semiconductor, Ferroelectric tunnel junction
Journal
APPLIED SURFACE SCIENCE
Volume 573, Issue -, Pages 151566
Publisher
Elsevier BV
Online
2021-10-12
DOI
10.1016/j.apsusc.2021.151566
References
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