An efficient approach for atomic-scale polishing of single-crystal silicon via plasma-based atom-selective etching
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Title
An efficient approach for atomic-scale polishing of single-crystal silicon via plasma-based atom-selective etching
Authors
Keywords
Single crystal silicon, Atomic-scale polishing, Plasma etching, Atomic and close-to-atomic scale manufacturing, Roughness
Journal
INTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE
Volume 159, Issue -, Pages 103649
Publisher
Elsevier BV
Online
2020-10-27
DOI
10.1016/j.ijmachtools.2020.103649
References
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