An efficient approach for atomic-scale polishing of single-crystal silicon via plasma-based atom-selective etching
出版年份 2020 全文链接
标题
An efficient approach for atomic-scale polishing of single-crystal silicon via plasma-based atom-selective etching
作者
关键词
Single crystal silicon, Atomic-scale polishing, Plasma etching, Atomic and close-to-atomic scale manufacturing, Roughness
出版物
INTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE
Volume 159, Issue -, Pages 103649
出版商
Elsevier BV
发表日期
2020-10-27
DOI
10.1016/j.ijmachtools.2020.103649
参考文献
相关参考文献
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