Electron Density and Optical Emission Measurements of SF6/O2Plasmas for Silicon Etch Processes

Published 2012 View Full Article

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Title
Electron Density and Optical Emission Measurements of SF6/O2Plasmas for Silicon Etch Processes
Authors
Keywords
-
Journal
PLASMA SCIENCE & TECHNOLOGY
Volume 14, Issue 4, Pages 316-320
Publisher
IOP Publishing
Online
2012-04-19
DOI
10.1088/1009-0630/14/4/09

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