Al2O3 ALD films grown using TMA + rare isotope 2H216O and 1H218O precursors
Published 2021 View Full Article
- Home
- Publications
- Publication Search
- Publication Details
Title
Al2O3 ALD films grown using TMA + rare isotope 2H216O and 1H218O precursors
Authors
Keywords
-
Journal
APPLIED SURFACE SCIENCE
Volume -, Issue -, Pages 148909
Publisher
Elsevier BV
Online
2021-01-22
DOI
10.1016/j.apsusc.2020.148909
References
Ask authors/readers for more resources
Related references
Note: Only part of the references are listed.- Consistency and reproducibility in atomic layer deposition
- (2020) Henrik H. Sønsteby et al. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
- Probing the Dielectric Properties of Ultrathin Al/Al2O3/Al Trilayers Fabricated Using in Situ Sputtering and Atomic Layer Deposition
- (2018) Jagaran Acharya et al. ACS Applied Materials & Interfaces
- Electrical characterization of amorphous Al2O3 dielectric films on n-type 4H-SiC
- (2018) R. Y. Khosa et al. AIP Advances
- Detailed Investigation of the Surface Mechanisms and their Interplay with Transport Phenomena in Alumina Atomic Layer Deposition from TMA and Water
- (2018) Georgios P. Gakis et al. CHEMICAL ENGINEERING SCIENCE
- Explorative studies of novel silicon surface passivation materials: Considerations and lessons learned
- (2018) L.E. Black et al. SOLAR ENERGY MATERIALS AND SOLAR CELLS
- Revisiting the growth mechanism of atomic layer deposition of Al2O3: A vibrational sum-frequency generation study
- (2017) Vincent Vandalon et al. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
- What is limiting low-temperature atomic layer deposition of Al2O3? A vibrational sum-frequency generation study
- (2016) V. Vandalon et al. APPLIED PHYSICS LETTERS
- Analysis of the degradation of BaTiO 3 resistivity due to hydrogen ion incorporation: Impedance spectroscopy and diffusion analysis
- (2015) Damoon Sohrabi Baba Heidary et al. ACTA MATERIALIA
- Cooperation between adsorbates accounts for the activation of atomic layer deposition reactions
- (2015) Mahdi Shirazi et al. Nanoscale
- Structural and XPS characterization of ALD Al2O3 coated porous silicon
- (2015) Igor Iatsunskyi et al. VACUUM
- Evaluating the merit of ALD coating as a barrier against hydrogen degradation in capacitor components
- (2015) Damoon Sohrabi Baba Heidary et al. RSC Advances
- Time-of-flight – Energy spectrometer for elemental depth profiling – Jyväskylä design
- (2014) Mikko Laitinen et al. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
- Potku – New analysis software for heavy ion elastic recoil detection analysis
- (2014) K. Arstila et al. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
- Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends
- (2013) Ville Miikkulainen et al. JOURNAL OF APPLIED PHYSICS
- Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion
- (2013) Oili M.E. Ylivaara et al. THIN SOLID FILMS
- Nanogranular Al2O3 proton conducting films for low-voltage oxide-based homojunction thin-film transistors
- (2013) Hongliang Zhang et al. Journal of Materials Chemistry C
- Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
- (2012) G. Dingemans et al. JOURNAL OF APPLIED PHYSICS
- Plasma-enhanced and thermal atomic layer deposition of Al2O3using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
- (2012) Stephen E. Potts et al. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
- Al2O3 and TiO2 Atomic Layer Deposition on Copper for Water Corrosion Resistance
- (2011) A. I. Abdulagatov et al. ACS Applied Materials & Interfaces
- Kinetic Isotope Effects in the Study of Organometallic Reaction Mechanisms
- (2011) Mar Gómez-Gallego et al. CHEMICAL REVIEWS
- Hydrogen induced passivation of Si interfaces by Al2O3 films and SiO2/Al2O3 stacks
- (2010) G. Dingemans et al. APPLIED PHYSICS LETTERS
- Quartz Crystal Microbalance Studies of Al2O3Atomic Layer Deposition Using Trimethylaluminum and Water at 125 °C†
- (2009) R. A. Wind et al. JOURNAL OF PHYSICAL CHEMISTRY A
- Atomic layer deposited aluminum oxide barrier coatings for packaging materials
- (2009) Terhi Hirvikorpi et al. THIN SOLID FILMS
- Gas Diffusion Barriers on Polymers Using Multilayers Fabricated by Al2O3and Rapid SiO2Atomic Layer Deposition
- (2008) Arrelaine A. Dameron et al. Journal of Physical Chemistry C
- Low-energy heavy-ion TOF-ERDA setup for quantitative depth profiling of thin films
- (2008) S. Giangrandi et al. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
Become a Peeref-certified reviewer
The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.
Get StartedAsk a Question. Answer a Question.
Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.
Get Started