Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure

Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies

(2018) Tahsin Faraz et al.   ACS Applied Materials & Interfaces

Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing

(2018) S. Karwal et al.   Journal of Materials Chemistry C

Low temperature (Ts/Tm 

(2018) Michelle Marie S. Villamayor et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Energetic Ions during Plasma-Enhanced Atomic Layer Deposition and their Role in Tailoring Material Properties

(2018) Tahsin Faraz et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition

(2017) S. Karwal et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma

(2015) Harm C. M. Knoops et al.   ACS Applied Materials & Interfaces

Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time

(2015) Harm C. M. Knoops et al.   APPLIED PHYSICS LETTERS

Channel shape and interpoly dielectric material effects on electrical characteristics of floating-gate-type three-dimensional fin channel flash memories

(2015) Yongxun Liu et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Optical modeling of plasma-deposited ZnO films: Electron scattering at different length scales

(2015) Harm C. M. Knoops et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Nature of Tunable Optical Reflectivity of Rocksalt Hafnium Nitride Films

(2014) Chaoquan Hu et al.   Journal of Physical Chemistry C

Ion kinetics in Ar/H2 cold plasmas: the relevance of ArH+

(2014) Miguel Jiménez-Redondo et al.   RSC Advances

Ion chemistry in H2-Ar low temperature plasmas

(2013) M. Sode et al.   JOURNAL OF APPLIED PHYSICS

Carbon Nanotube Complementary Wrap-Gate Transistors

(2013) Aaron D. Franklin et al.   NANO LETTERS

Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth

(2012) H. B. Profijt et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Ion energy distribution measurements in rf and pulsed dc plasma discharges

(2012) D Gahan et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas

(2011) H. C. M. Knoops et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Tunable electrical and optical properties of hafnium nitride thin films

(2010) I. L. Farrell et al.   APPLIED PHYSICS LETTERS

Atomic Layer Deposition of Aluminum Oxide in Mesoporous Silica Gel

(2010) Jeffrey W. Elam et al.   Journal of Physical Chemistry C

?Characteristics of HfN Films Deposited by Remote Plasma-enhanced Atomic Layer Deposition

(2010) Wooho Jeong et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

A structure zone diagram including plasma-based deposition and ion etching

(2009) André Anders   THIN SOLID FILMS

Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications

(2008) Steven Consiglio et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Retarding field analyzer for ion energy distribution measurements at a radio-frequency biased electrode

(2008) D. Gahan et al.   REVIEW OF SCIENTIFIC INSTRUMENTS

Preparation of conductive HfN by post rapid thermal annealing-assisted MOCVD and its application to metal gate electrode

(2007) Wenwu Wang et al.   MICROELECTRONIC ENGINEERING