PLASMA CHEMISTRY AND PLASMA PROCESSING
Note: The following journal information is for reference only. Please check the journal website for updated information prior to submission.
Journal Title
PLASMA CHEMISTRY AND PLASMA PROCESSING
PLASMA CHEM PLASMA P
ISSN / eISSN
0272-4324 / 1572-8986
Aims and Scope
Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.
Subject Area
PHYSICS, FLUIDS & PLASMAS
ENGINEERING, CHEMICAL
PHYSICS, APPLIED
CiteScore
5.40
View Trend
CiteScore Ranking
| Category | Quartile | Rank |
|---|---|---|
| Materials Science - Surfaces, Coatings and Films | Q1 | #30/129 |
| Materials Science - General Chemical Engineering | Q1 | #70/280 |
| Materials Science - Condensed Matter Physics | Q2 | #106/415 |
| Materials Science - General Chemistry | Q2 | #110/409 |
Web of Science Core Collection
| Science Citation Index Expanded (SCIE) | Social Sciences Citation Index (SSCI) |
|---|---|
| Indexed | - |
| Category (Journal Citation Reports 2022) | Quartile |
|---|---|
| PHYSICS, FLUIDS & PLASMAS - SCIE | Q2 |
| PHYSICS, APPLIED - SCIE | Q2 |
| ENGINEERING, CHEMICAL - SCIE | Q2 |
H-index
57
Country/Area of Publication
UNITED STATES
Publisher
Springer US
Publication Frequency
Quarterly
Year Publication Started
1981
Annual Article Volume
74
Open Access
NO
Contact
SPRINGER, 233 SPRING ST, NEW YORK, USA, NY, 10013
