Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
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Title
Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
Authors
Keywords
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Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 30, Issue 1, Pages 01A101
Publisher
American Vacuum Society
Online
2011-08-27
DOI
10.1116/1.3625565
References
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- (2009) J H van Helden et al. PLASMA SOURCES SCIENCE & TECHNOLOGY
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