The Characteristics of Transparent Non-Volatile Memory Devices Employing Si-Rich SiOX as a Charge Trapping Layer and Indium-Tin-Zinc-Oxide
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Title
The Characteristics of Transparent Non-Volatile Memory Devices Employing Si-Rich SiOX as a Charge Trapping Layer and Indium-Tin-Zinc-Oxide
Authors
Keywords
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Journal
Nanomaterials
Volume 9, Issue 5, Pages 784
Publisher
MDPI AG
Online
2019-05-23
DOI
10.3390/nano9050784
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